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I can't help but chuckle when I read this. Entire industries, flat panel, semiconductor, etc. are moving to NF3 as an oxone-friendly flourine source for etch and clean processes. Remember the ozone layer--the cause célèbre in the '80s? Do you want us to go back to CFCs?
I'm doing an assignment on the particular issue. And i found this page to be absolutly no help at all. Thanks alot. You've just made this girls assignment alot harder.
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